Electron irradiation induced crystallization of amorphous Al2O3 films on silicon substrates

J. Liu; C. J. Barbero; J. W. Corbett; K. Rajan; H. Leary

doi:10.1557/proc-311-239

Electron irradiation induced crystallization of amorphous Al₂O₃ films on silicon substrates

J. Liu
, C. J. Barbero
, J. W. Corbett
, K. Rajan
, H. Leary

Department of Materials Design and Innovation

Technology in Automation and Robotics

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution › peer-review

8 Scopus citations

Abstract

An in situ study of electron beam irradiation induced amorphous-to-crystalline transformation of Al₂O₃ films on silicon substrates has been carried out using transmission electron microscopy. Trigonal α-Al₂O₃ crystallites can be observed for electron beam dose rates larger than 10 mA/cm². It is found that the nucleation and growth processes dominate near the Al₂O₃-Si interface. The possible effect of the silicon substrate on the growth of Al₂O₃ crystallites is considered.

Original language	English
Title of host publication	Thermodynamics and Kinetics
Publisher	Publ by Materials Research Society
Pages	239-244
Number of pages	6
ISBN (Print)	1558992073, 9781558992078
DOIs	https://doi.org/10.1557/proc-311-239
State	Published - 1993
Event	Proceedings of the Symposium on Phase Transformations in Thin Films - San Francisco, CA, USA Duration: Apr 13 1993 → Apr 15 1993

Publication series

Name	Materials Research Society Symposium Proceedings
Volume	311
ISSN (Print)	0272-9172

Conference

Conference	Proceedings of the Symposium on Phase Transformations in Thin Films
City	San Francisco, CA, USA
Period	04/13/93 → 04/15/93

Access to Document

10.1557/proc-311-239

Cite this

@inproceedings{e1d6bb1ee6964da99ff6b4276b089b6c,

title = "Electron irradiation induced crystallization of amorphous Al2O3 films on silicon substrates",

abstract = "An in situ study of electron beam irradiation induced amorphous-to-crystalline transformation of Al2O3 films on silicon substrates has been carried out using transmission electron microscopy. Trigonal α-Al2O3 crystallites can be observed for electron beam dose rates larger than 10 mA/cm2. It is found that the nucleation and growth processes dominate near the Al2O3-Si interface. The possible effect of the silicon substrate on the growth of Al2O3 crystallites is considered.",

author = "J. Liu and Barbero, \{C. J.\} and Corbett, \{J. W.\} and K. Rajan and H. Leary",

year = "1993",

doi = "10.1557/proc-311-239",

language = "English",

isbn = "1558992073",

series = "Materials Research Society Symposium Proceedings",

publisher = "Publ by Materials Research Society",

pages = "239--244",

booktitle = "Thermodynamics and Kinetics",

note = "Proceedings of the Symposium on Phase Transformations in Thin Films ; Conference date: 13-04-1993 Through 15-04-1993",

}

Liu, J, Barbero, CJ, Corbett, JW, Rajan, K & Leary, H 1993, Electron irradiation induced crystallization of amorphous Al₂O₃ films on silicon substrates. in Thermodynamics and Kinetics. Materials Research Society Symposium Proceedings, vol. 311, Publ by Materials Research Society, pp. 239-244, Proceedings of the Symposium on Phase Transformations in Thin Films, San Francisco, CA, USA, 04/13/93. https://doi.org/10.1557/proc-311-239

Electron irradiation induced crystallization of amorphous Al₂O₃ films on silicon substrates. / Liu, J.; Barbero, C. J.; Corbett, J. W. et al.
Thermodynamics and Kinetics. Publ by Materials Research Society, 1993. p. 239-244 (Materials Research Society Symposium Proceedings; Vol. 311).

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution › peer-review

TY - GEN

T1 - Electron irradiation induced crystallization of amorphous Al2O3 films on silicon substrates

AU - Liu, J.

AU - Barbero, C. J.

AU - Corbett, J. W.

AU - Rajan, K.

AU - Leary, H.

PY - 1993

Y1 - 1993

N2 - An in situ study of electron beam irradiation induced amorphous-to-crystalline transformation of Al2O3 films on silicon substrates has been carried out using transmission electron microscopy. Trigonal α-Al2O3 crystallites can be observed for electron beam dose rates larger than 10 mA/cm2. It is found that the nucleation and growth processes dominate near the Al2O3-Si interface. The possible effect of the silicon substrate on the growth of Al2O3 crystallites is considered.

AB - An in situ study of electron beam irradiation induced amorphous-to-crystalline transformation of Al2O3 films on silicon substrates has been carried out using transmission electron microscopy. Trigonal α-Al2O3 crystallites can be observed for electron beam dose rates larger than 10 mA/cm2. It is found that the nucleation and growth processes dominate near the Al2O3-Si interface. The possible effect of the silicon substrate on the growth of Al2O3 crystallites is considered.

UR - https://www.scopus.com/pages/publications/0027268902

U2 - 10.1557/proc-311-239

DO - 10.1557/proc-311-239

M3 - Conference contribution

AN - SCOPUS:0027268902

SN - 1558992073

SN - 9781558992078

T3 - Materials Research Society Symposium Proceedings

SP - 239

EP - 244

BT - Thermodynamics and Kinetics

PB - Publ by Materials Research Society

T2 - Proceedings of the Symposium on Phase Transformations in Thin Films

Y2 - 13 April 1993 through 15 April 1993

ER -