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Electromigration time to failure

  • SUNY Buffalo

Research output: Chapter in Book/Report/Conference proceedingConference contributionpeer-review

1 Scopus citations

Abstract

Electromigration time to failure and electrical resistivity of 95.5%Sn-1.5%Ag-0.5%Cu-0.03W%Ni (SACN) microelectronics solder joints have been investigated experimentally. A Black's type electromigration time to failure equation is developed to describe the time to failure versus current density and temperature. It is observed that resistance of a solder joint is not just a function of the temperature but also a function of the current density. The activation energy over the range of 83°C∼174°C is measured to be 0.77±0.12eV, and the current density exponent is found to be (8.60±1.65). It is also shown that the most commonly used Black's electromigration time to failure equation cannot be used for solder joints.

Original languageEnglish
Title of host publicationGrand Challenges in Modeling and Simulation Symposium, GCMS 2010 - Proceedings of the 2010 Summer Simulation Multiconference, SummerSim 2010
Pages72-79
Number of pages8
Edition3 BOOK
StatePublished - 2010
EventGrand Challenges in Modeling and Simulation Symposium, GCMS 2010, Part of the 2010 Summer Simulation Multiconference, SummerSim 2010 - Ottawa, ON, Canada
Duration: Jul 12 2010Jul 14 2010

Publication series

NameGrand Challenges in Modeling and Simulation Symposium, GCMS 2010 - Proceedings of the 2010 Summer Simulation Multiconference, SummerSim 2010
Number3 BOOK

Conference

ConferenceGrand Challenges in Modeling and Simulation Symposium, GCMS 2010, Part of the 2010 Summer Simulation Multiconference, SummerSim 2010
Country/TerritoryCanada
CityOttawa, ON
Period07/12/1007/14/10

Keywords

  • Electromigration
  • Lead-free solder joints
  • Resistance evolution
  • Solder joint resistance
  • Temperature coefficient of resistance
  • Time to failure

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