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Electroforming-Free HfO2:CeO2 Vertically Aligned Nanocomposite Memristors with Anisotropic Dielectric Response

  • Hongyi Dou
  • , Xingyao Gao
  • , Di Zhang
  • , Samyak Dhole
  • , Zhimin Qi
  • , Bo Yang
  • , Md Nazmul Hasan
  • , Jung Hun Seo
  • , Quanxi Jia
  • , Markus Hellenbrand
  • , Judith L. MacManus-Driscoll
  • , Xinghang Zhang
  • , Haiyan Wang
  • Purdue University
  • SUNY Buffalo
  • University of Cambridge

Research output: Contribution to journalArticlepeer-review

19 Scopus citations

Abstract

Resistive switching and anisotropic optical properties have been investigated in two-phase HfO2:CeO2 nanocomposite thin films of different HfO2:CeO2 ratios of 3:1, 1:1, and 1:3 on single-crystalline SrTiO3(001) substrates. Vertically aligned nanocomposite (VAN) thin films with CeO2 pillars embedded in a HfO2 matrix have been obtained using a one-step pulsed laser deposition technique. By adjusting the molar ratio of HfO2 and CeO2 in the films, the resistive switching effect and the anisotropic dielectric response were tuned and correlated with the density of the conducting vertical-phase boundaries. It is shown that only HfO2:CeO2 VAN films of 1:1 composition give rise to a forming-free switching system as they have clear vertical boundaries that guide oxygen vacancy channels. These films show strong promise for resistive switching memory devices.

Original languageEnglish
Pages (from-to)5278-5286
Number of pages9
JournalACS Applied Electronic Materials
Volume3
Issue number12
DOIs
StatePublished - Dec 28 2021

Keywords

  • anisotropy
  • CeO
  • electroforming free
  • HfO
  • oxygen vacancies
  • resistive switching
  • vertically aligned nanocomposite (VAN)

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