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Electrical characterization of ITO/p-InP solar cells

  • SUNY Buffalo

Research output: Chapter in Book/Report/Conference proceedingConference contributionpeer-review

Abstract

Indium tin oxide (ITO)/p-InP solar diodes were fabricated by RF magnetron sputtering with variables of hydrogen during deposition, substrate temperature and in one case, an 80 A Sn:In layer between ITO and InP. Analysis by current-voltage-temperature and spectroscopic techniques reveal the healing effect of adding H2 during deposition of ITO. Higher substrate temperature during ITO deposition gives improved ITO films but induces more surface defects. Current conduction is predominantly by thermionic emission. An 80 A In:Sn layer between InP and ITO causes a significant change in all measured data.

Original languageEnglish
Title of host publicationConference Record of the IEEE Photovoltaic Specialists Conference
Editors Anon
PublisherPubl by IEEE
Pages1432-1436
Number of pages5
ISBN (Print)0780312201
StatePublished - 1993
EventProceedings of the 23rd IEEE Photovoltaic Specialists Conference - Louisville, KY, USA
Duration: May 10 1993May 14 1993

Publication series

NameConference Record of the IEEE Photovoltaic Specialists Conference
ISSN (Print)0160-8371

Conference

ConferenceProceedings of the 23rd IEEE Photovoltaic Specialists Conference
CityLouisville, KY, USA
Period05/10/9305/14/93

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