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Diffusion length of Ga adatoms on GaAs (1̄1̄1̄) surface in the 19 ×19 reconstruction growth regime

  • Rensselaer Polytechnic Institute

Research output: Contribution to journalArticlepeer-review

4 Scopus citations

Abstract

Faceted surface morphologies of homoepitaxial films grown on exactly (1̄1̄1̄)-oriented GaAs substrates in the 19 ×19 regime are studied with an atomic force microscope. The facets are composed of three vicinal surfaces tilted about 2°toward [21̄1̄], [1̄21̄], and [1̄1̄2] directions, respectively. The diffusion length at the growth condition is estimated from the surface morphologies and found to be at least hundreds of nanometers. It is comparable to the diffusion length on the (100) surface grown under the same conditions. Therefore, the facet formation on GaAs (1̄1̄1̄) film is unlikely caused by slower surface mobility.

Original languageEnglish
Pages (from-to)1641-1643
Number of pages3
JournalApplied Physics Letters
Volume64
Issue number13
DOIs
StatePublished - 1994

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