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Dielectric properties of epitaxial Ba 0.6Sr 0.4TiO 3 films on SiO 2/Si using biaxially oriented ion-beam-assisted-deposited MgO as templates

  • B. S. Kang
  • , Jang Sik Lee
  • , L. Stan
  • , J. K. Lee
  • , R. F. DePaula
  • , P. N. Arendt
  • , M. Nastasi
  • , Q. X. Jia
  • Los Alamos National Laboratory Materials Science and Technology Division

Research output: Contribution to journalArticlepeer-review

18 Scopus citations

Abstract

We have epitaxially deposited Ba 0.6Sr 0.4TiO 3 (BST) thin films on SiO 2/Si substrates using pulsed laser deposition by introducing biaxially oriented ion-beam-assisted-deposited MgO as templates. The structural properties of the BST films were strongly affected by the crystallinity of the templates. The dielectric loss of the BST film was found to decrease as its in-plane texture alignment was improved. As a result, a relatively larger figure of merit K value, defined as tunability/loss, was obtained for the films with better in-plane crystallinity. The K factor ranged between 7.5 and 3.5 when the in-plane alignment of the MgO templates was varied from 5.0° to 10.5°. This work demonstrates that the crystalline quality of the template layers plays a critical role in monolithic integration of BST with SiO 2/Si for frequency agile devices.

Original languageEnglish
Pages (from-to)4702-4704
Number of pages3
JournalApplied Physics Letters
Volume85
Issue number20
DOIs
StatePublished - Nov 15 2004

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