Skip to main navigation Skip to search Skip to main content

Damage mechanics of low temperature electromigration and thermomigration

  • SUNY Buffalo

Research output: Contribution to journalArticlepeer-review

29 Scopus citations

Abstract

Electromigration (EM) and thermomigration (TM) are processes of mass transport which are critical reliability issue for next generation nanoelectronics. The purpose of this project is to study the influence of low temperature on EM and TM interaction. In this paper, a model for EM and TM process is proposed and has been implemented in finite element method. The governing equations include mass conservation, force equilibrium, heat transfer, and electricity conduction equations. A damage evolution model based on thermodynamics is introduced to evaluate the degradation in solder joints subjected to high current densities and high temperature gradients. The results are compared with experimental data to validate the model.

Original languageEnglish
Pages (from-to)478-485
Number of pages8
JournalIEEE Transactions on Advanced Packaging
Volume32
Issue number2
DOIs
StatePublished - 2009

Keywords

  • Copper
  • Current density
  • Damage mechanics
  • Electromigration
  • Equations
  • Force
  • Mathematical model
  • Power electronics packaging
  • Solder joint reliability
  • Soldering
  • Thermomigration

Fingerprint

Dive into the research topics of 'Damage mechanics of low temperature electromigration and thermomigration'. Together they form a unique fingerprint.

Cite this