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Current transport, gate dielectrics and band gap engineering in graphene devices

  • Wenjuan Zhu
  • , Vasili Perebeinos
  • , Deborah Neumayer
  • , Marcus Freitag
  • , Keith Jenkins
  • , Yu Zhu
  • , Phaedon Avouris
  • IBM

Research output: Chapter in Book/Report/Conference proceedingConference contributionpeer-review

1 Scopus citations

Abstract

In this work, we studied current transport in mono-, bi- and tri-layer graphene. We find that both the temperature and carrier density dependencies in monolayer and bi-/tri-layers are diametrically opposite. These difference can be understood by the different density-of-states and the additional screening of the electrical field of the substrate surface polar phonons in bi-layer/tri-layer graphenes. We also find that silicon nitride can provide uniform coverage of graphene in field-effect transistors while preserving the channel mobility. Using this insulator, we studied field-induced band-gap or band-overlap in graphene with various numbers of layers.

Original languageEnglish
Title of host publicationICSICT-2010 - 2010 10th IEEE International Conference on Solid-State and Integrated Circuit Technology, Proceedings
Pages1214-1217
Number of pages4
DOIs
StatePublished - 2010
Event2010 10th IEEE International Conference on Solid-State and Integrated Circuit Technology - Shanghai, China
Duration: Nov 1 2010Nov 4 2010

Publication series

NameICSICT-2010 - 2010 10th IEEE International Conference on Solid-State and Integrated Circuit Technology, Proceedings

Conference

Conference2010 10th IEEE International Conference on Solid-State and Integrated Circuit Technology
Country/TerritoryChina
CityShanghai
Period11/1/1011/4/10

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