Crystallized amorphous silicon for low-cost solar cells

Hydrogenated amorphous silicon (a-Si:H), 1-10 μm thick, was deposited onto stainless steel and molybdenum sheets using catholic d.c. glow discharge in a gradient field and by plasma-enhanced chemical vapor deposition. The films were subsequently crystallized by isothermal heating in N₂, rapid thermal processing, isothermal annealing in vacuum (IAV) or isothermal annealing after vycor encapsulation (IAE). All techniques led to crystallization as revealed by X-ray diffraction. Annealing by IAV at 1000 °C for 7 h or IAE at 700 °C for 8 h gave the most intense (111) silicon diffraction peaks. Auger electron spectroscopy showed significant diffusion of iron into the silicon for stainless steel substrates. Energy recoil detection of as-deposited a-Si:H showed good uniformity of both silicon and hydrogen.