Abstract
A highly versatile temperature controllable ultrahigh vacuum (UHV) manipulator system is described. In this system, the sample is pumped down in a separate chamber so that the base pressure in the XPS main chamber is not disturbed.
| Original language | English |
|---|---|
| Pages (from-to) | 567-569 |
| Number of pages | 3 |
| Journal | Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films |
| Volume | 18 |
| Issue number | 2 |
| DOIs | |
| State | Published - Mar 2000 |
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