Coulostatic Deposition of Metals at Underpotential: I. Potential Relaxation in the Absence of Chemical Reactions

Under commonly occurring conditions, coulostatic processes can lead to underpotential deposition of a metal on a foreign metal substrate. These deposition processes are described quantitatively in terms of the isotherm for underpotential metal deposition, the double layer capacitance of the electrode surface, and the initial potential of the electrode. Coulostatically controlled underpotential deposition is demonstrated for silver on gold and platinum and for mercury on gold.