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Controlling crystal structure and oxidation state in molybdenum nitrides through epitaxial stabilization

  • Hongmei Luo
  • , Guifu Zou
  • , Haiyan Wang
  • , Joon Hwan Lee
  • , Yuan Lin
  • , Huisheng Peng
  • , Qianglu Lin
  • , Shuguang Deng
  • , Eve Bauer
  • , T. Mark McCleskey
  • , Anthony K. Burrell
  • , Quanxi Jia
  • New Mexico State University College of Engineering
  • Los Alamos National Laboratory
  • Texas A&M University
  • University of Electronic Science and Technology of China
  • Fudan University

Research output: Contribution to journalArticlepeer-review

41 Scopus citations

Abstract

Epitaxial molybdenum nitride films with different crystal structures and chemical compositions were successfully synthesized by a chemical solution deposition technique. Hexagonal MoN was stabilized on c-cut sapphire (Al 2O3) but cubic Mo2N on (001) SrTiO3 even though exactly the same Mo-polymer precursor solution and the processing parameters (such as the annealing temperature and environment) were used. Both X-ray diffraction and high-resolution transmission electron microscopy confirmed the growth of epitaxial molybdenum nitride films with an epitaxial relationship between the film and the substrate as (0001)MoN||(0001) Al2O3 and [101̄0]MoN||[112̄0]Al2O3 for MoN on c-cut Al2O3 and (001)Mo2N||(001) STO and [111]Mo2N||[111]STO for Mo2N on SrTiO3. The formation of epitaxial molybdenum nitride films with different oxidation states resulted in very different electrical properties: a superconducting transition temperature of 12 K for MoN, whereas it was 4.5 K for Mo2N.

Original languageEnglish
Pages (from-to)17880-17883
Number of pages4
JournalJournal of Physical Chemistry C
Volume115
Issue number36
DOIs
StatePublished - Sep 15 2011

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