Chemical solution deposition of epitaxial carbide films

Guifu Zou; Haiyan Wang; Nathan Mara; Hongmei Luo; Nan Li; Zengfeng Di; Eve Bauer; Yongqiang Wang; Thomas McCleskey; Anthony Burrell; Xinghang Zhang; Michael Nastasi; Quanxi Jia

doi:10.1021/ja9102315

Chemical solution deposition of epitaxial carbide films

Guifu Zou
, Haiyan Wang
, Nathan Mara
, Hongmei Luo
, Nan Li
, Zengfeng Di
, Eve Bauer
, Yongqiang Wang
, Thomas McCleskey
, Anthony Burrell
, Xinghang Zhang
, Michael Nastasi
, Quanxi Jia

Department of Materials Design and Innovation

Los Alamos National Laboratory
Texas A&M University
New Mexico State University

Research output: Contribution to journal › Article › peer-review

45 Scopus citations

Abstract

(Figure Presented) Carbide films exhibit many unique properties. The development of a versatile and simple technique for the deposition of carbide films will enable a wide range of technological applications. Here we report a cost-effective chemical solution deposition or polymer-assisted deposition method for growing epitaxial carbide (including TiC, VC, and TaC) films. These epitaxial carbide films exhibit structural and physical properties similar to the films grown by vapor deposition methods.

Original language	English
Pages (from-to)	2516-2517
Number of pages	2
Journal	Journal of the American Chemical Society
Volume	132
Issue number	8
DOIs	https://doi.org/10.1021/ja9102315
State	Published - Feb 24 2010

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10.1021/ja9102315

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title = "Chemical solution deposition of epitaxial carbide films",

abstract = "(Figure Presented) Carbide films exhibit many unique properties. The development of a versatile and simple technique for the deposition of carbide films will enable a wide range of technological applications. Here we report a cost-effective chemical solution deposition or polymer-assisted deposition method for growing epitaxial carbide (including TiC, VC, and TaC) films. These epitaxial carbide films exhibit structural and physical properties similar to the films grown by vapor deposition methods.",

author = "Guifu Zou and Haiyan Wang and Nathan Mara and Hongmei Luo and Nan Li and Zengfeng Di and Eve Bauer and Yongqiang Wang and Thomas McCleskey and Anthony Burrell and Xinghang Zhang and Michael Nastasi and Quanxi Jia",

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TY - JOUR

T1 - Chemical solution deposition of epitaxial carbide films

AU - Zou, Guifu

AU - Wang, Haiyan

AU - Mara, Nathan

AU - Luo, Hongmei

AU - Li, Nan

AU - Di, Zengfeng

AU - Bauer, Eve

AU - Wang, Yongqiang

AU - McCleskey, Thomas

AU - Burrell, Anthony

AU - Zhang, Xinghang

AU - Nastasi, Michael

AU - Jia, Quanxi

PY - 2010/2/24

Y1 - 2010/2/24

N2 - (Figure Presented) Carbide films exhibit many unique properties. The development of a versatile and simple technique for the deposition of carbide films will enable a wide range of technological applications. Here we report a cost-effective chemical solution deposition or polymer-assisted deposition method for growing epitaxial carbide (including TiC, VC, and TaC) films. These epitaxial carbide films exhibit structural and physical properties similar to the films grown by vapor deposition methods.

AB - (Figure Presented) Carbide films exhibit many unique properties. The development of a versatile and simple technique for the deposition of carbide films will enable a wide range of technological applications. Here we report a cost-effective chemical solution deposition or polymer-assisted deposition method for growing epitaxial carbide (including TiC, VC, and TaC) films. These epitaxial carbide films exhibit structural and physical properties similar to the films grown by vapor deposition methods.

UR - https://www.scopus.com/pages/publications/77950426097

U2 - 10.1021/ja9102315

DO - 10.1021/ja9102315

M3 - Article

AN - SCOPUS:77950426097

SN - 0002-7863

VL - 132

SP - 2516

EP - 2517

JO - Journal of the American Chemical Society

JF - Journal of the American Chemical Society

IS - 8

ER -

Chemical solution deposition of epitaxial carbide films

Abstract

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