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Chemical-mechanical polishing of oxide thin films: The rebinder-westwood phenomenon revisited

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Abstract

The role of hydrogen interactions and diffusion in oxide thin films subjected to chemical-mechanical polishing is assessed through Fourier transform infrared spectroscopy (FTIR). The results are discussed in the context of the efficacy of hydrogen transport on controlling the properties of thin oxide films and structural descriptions of oxide glasses. The implications of these results are for the first time put into the context of the early work of Rebinder and Westwood on chemical induced surface modifications in materials and their effect on wear behavior.

Original languageEnglish
Pages (from-to)1581-1584
Number of pages4
JournalJournal of Electronic Materials
Volume25
Issue number10
DOIs
StatePublished - Oct 1996

Keywords

  • Chemical-mechanical polishing
  • Environmentally sensitive fracture
  • Fourier transform infrared spectroscopy (FTIR)
  • Oxide films
  • Surface plasticity
  • Zeta potential

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