Abstract
Ferroelectric tunnel junction (FTJ) is a promising low power nonvolatile memory for beyond-CMOS applications. In this paper, Co/BaTiO3/SrRuO3 FTJs are fabricated, simulated, and their electrical characteristics are measured by capacitance-voltage (C-V), current.voltage (I-V ), and high-frequency S-parameter measurements. Ferroelectricity of the ultrathin BaTiO3 (∼3.2 nm) film is first verified by a butterfly shaped hysteresis C-V profile, from which saturation polarizations are calculated in the ON state and OFF state as PON = +20 μC/cm2 and POFF = -25 μC/cm2, respectively. The numerical simulation of the FTJ device is performed using experimental electronic band parameters of the heterostructure. The device structure was optimized for ON/OFF ratio, ION/IOFF = 75 for a depolarization field, Edpol < 106 V/cm. The calculated tunnel currents of 250 nm × 250 nm FTJ in ON state (ION = 130 × 10-9 A) and OFF state (IOFF = 1.75 × 10-9 A) match with experimental values. From the S-parameters of RF measurements, the high-frequency small-signal device model of the FTJ in ON state (CON = 5 fF, RON = 0.8 MΩ) and OFF state (COFF = 10 fF, ROFF = 70 MΩ) is developed for a frequency range from 50 MHz to 5 GHz. The extracted capacitor model of Co/BaTiO3/SrRuO3 FTJ is useful for high-frequency simulation of benchmark FTJ circuits.
| Original language | English |
|---|---|
| Article number | 8681233 |
| Pages (from-to) | 2186-2191 |
| Number of pages | 6 |
| Journal | IEEE Transactions on Electron Devices |
| Volume | 66 |
| Issue number | 5 |
| DOIs | |
| State | Published - May 2019 |
Keywords
- Benchmarking
- beyond CMOS
- ferroelectric capacitor
- ferroelectric tunnel junction
- FTJ memory
- hysteresis C-V profile
- nonvolatile memory
- S-parameter
- tunnel current
- ultrathin ferroelectric oxide (FEO)
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