Analysis of silicon-oxide-silicon nitride stacks by medium-energy ion scattering

D. Landheer; P. Ma; W. N. Lennard; I. V. Mitchell; C. McNorgan

doi:10.1116/1.1285991

Analysis of silicon-oxide-silicon nitride stacks by medium-energy ion scattering

D. Landheer
, P. Ma
, W. N. Lennard
, I. V. Mitchell
, C. McNorgan

National Research Council of Canada
Western University

Research output: Contribution to journal › Conference article › peer-review

4 Scopus citations

Abstract

Silicon-oxide-silicon stacks are analyzed medium-energy ion scattering (MEIS) which measures the nitrogen and oxygen concentration profiles through the gate dielectric stack. The stacks uses an electron-cyclotron resonance (ECR) plasma source which were formed by using an ECR chemical vapor deposition technique to deposit nitride films on silicon substrate oxidized with nitrogen oxide using an ECR plasma.

Original language	English
Pages (from-to)	2503-2506
Number of pages	4
Journal	Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Volume	18
Issue number	5
DOIs	https://doi.org/10.1116/1.1285991
State	Published - Sep 2000
Event	47th International Symposium: Vacuum, Thin Films, Surfaces/Interfaces, and Processing - Boston, USA Duration: Oct 2 2000 → Oct 6 2000

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@article{7602188e192d49a896c0c029c0b43161,

title = "Analysis of silicon-oxide-silicon nitride stacks by medium-energy ion scattering",

abstract = "Silicon-oxide-silicon stacks are analyzed medium-energy ion scattering (MEIS) which measures the nitrogen and oxygen concentration profiles through the gate dielectric stack. The stacks uses an electron-cyclotron resonance (ECR) plasma source which were formed by using an ECR chemical vapor deposition technique to deposit nitride films on silicon substrate oxidized with nitrogen oxide using an ECR plasma.",

author = "D. Landheer and P. Ma and Lennard, \{W. N.\} and Mitchell, \{I. V.\} and C. McNorgan",

year = "2000",

month = sep,

doi = "10.1116/1.1285991",

language = "English",

volume = "18",

pages = "2503--2506",

journal = "Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films",

issn = "0734-2101",

publisher = "AVS Science and Technology Society",

number = "5",

note = "47th International Symposium: Vacuum, Thin Films, Surfaces/Interfaces, and Processing ; Conference date: 02-10-2000 Through 06-10-2000",

}

TY - JOUR

T1 - Analysis of silicon-oxide-silicon nitride stacks by medium-energy ion scattering

AU - Landheer, D.

AU - Ma, P.

AU - Lennard, W. N.

AU - Mitchell, I. V.

AU - McNorgan, C.

PY - 2000/9

Y1 - 2000/9

N2 - Silicon-oxide-silicon stacks are analyzed medium-energy ion scattering (MEIS) which measures the nitrogen and oxygen concentration profiles through the gate dielectric stack. The stacks uses an electron-cyclotron resonance (ECR) plasma source which were formed by using an ECR chemical vapor deposition technique to deposit nitride films on silicon substrate oxidized with nitrogen oxide using an ECR plasma.

AB - Silicon-oxide-silicon stacks are analyzed medium-energy ion scattering (MEIS) which measures the nitrogen and oxygen concentration profiles through the gate dielectric stack. The stacks uses an electron-cyclotron resonance (ECR) plasma source which were formed by using an ECR chemical vapor deposition technique to deposit nitride films on silicon substrate oxidized with nitrogen oxide using an ECR plasma.

UR - https://www.scopus.com/pages/publications/0034273894

U2 - 10.1116/1.1285991

DO - 10.1116/1.1285991

M3 - Conference article

AN - SCOPUS:0034273894

SN - 0734-2101

VL - 18

SP - 2503

EP - 2506

JO - Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

JF - Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

IS - 5

T2 - 47th International Symposium: Vacuum, Thin Films, Surfaces/Interfaces, and Processing

Y2 - 2 October 2000 through 6 October 2000

ER -

Analysis of silicon-oxide-silicon nitride stacks by medium-energy ion scattering

Abstract

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