Abstract
An accurate estimate of interfacial stresses in multi-layered microelectronic packaging is very important for design and prediction of delamination-related failures. An analytical model for stress analysis of multi-layered stacks, which is based on an extension of Valisetty's model (Bending of Beams, Plates and Laminates: Refined Theories and Comparative Studies, Ph.D. thesis, Georgia Institute of Technology, Atlanta, March 1983), is proposed in this paper. This analytical approach considers each layer as a beam-type plate with orthotropic material properties. A new miniature material testing unit is developed. High sensitive Moiré interferometry was used to measure the strain field in the bi-material interfaces. The test data is in good agreement with the proposed analytical solution. The problem is also analyzed by a finite element analysis. Comparison of all three results indicates that the analytical procedure is far superior to finite element analysis for this problem.
| Original language | English |
|---|---|
| Pages (from-to) | 3331-3345 |
| Number of pages | 15 |
| Journal | International Journal of Solids and Structures |
| Volume | 40 |
| Issue number | 13-14 |
| DOIs | |
| State | Published - 2003 |
Keywords
- Interfacial delamination
- Interfacial stress
- Microelectronic packaging
- Moiré interferometry
- Multi-layered structure
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