An in situ transmission electron microscopy study of electron-beam-induced amorphous-to-crystalline transformation of Al2O3 films on silicon

J. Liu; C. J. Barbero; J. W. Corbett; K. Rajan; H. Leary

doi:10.1063/1.353757

An in situ transmission electron microscopy study of electron-beam-induced amorphous-to-crystalline transformation of Al₂O₃ films on silicon

J. Liu
, C. J. Barbero
, J. W. Corbett
, K. Rajan
, H. Leary

Department of Materials Design and Innovation

SUNY Albany
IBM

Research output: Contribution to journal › Article › peer-review

13 Scopus citations

Abstract

An in situ transmission electron microscopy study of the amorphous-to-crystalline transformation of Al₂O₃ films on a silicon substrate has been carried out. It is found that a critical electron-beam dose rate is required for the transformation to be observed. The possible effect of the silicon substrate on the growth of the Al ₂O₃ crystallites is also discussed.

Original language	English
Pages (from-to)	5272-5273
Number of pages	2
Journal	Journal of Applied Physics
Volume	73
Issue number	10
DOIs	https://doi.org/10.1063/1.353757
State	Published - 1993

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10.1063/1.353757

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title = "An in situ transmission electron microscopy study of electron-beam-induced amorphous-to-crystalline transformation of Al2O3 films on silicon",

abstract = "An in situ transmission electron microscopy study of the amorphous-to-crystalline transformation of Al2O3 films on a silicon substrate has been carried out. It is found that a critical electron-beam dose rate is required for the transformation to be observed. The possible effect of the silicon substrate on the growth of the Al 2O3 crystallites is also discussed.",

author = "J. Liu and Barbero, \{C. J.\} and Corbett, \{J. W.\} and K. Rajan and H. Leary",

year = "1993",

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journal = "Journal of Applied Physics",

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publisher = "American Institute of Physics",

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T1 - An in situ transmission electron microscopy study of electron-beam-induced amorphous-to-crystalline transformation of Al2O3 films on silicon

AU - Liu, J.

AU - Barbero, C. J.

AU - Corbett, J. W.

AU - Rajan, K.

AU - Leary, H.

PY - 1993

Y1 - 1993

N2 - An in situ transmission electron microscopy study of the amorphous-to-crystalline transformation of Al2O3 films on a silicon substrate has been carried out. It is found that a critical electron-beam dose rate is required for the transformation to be observed. The possible effect of the silicon substrate on the growth of the Al 2O3 crystallites is also discussed.

AB - An in situ transmission electron microscopy study of the amorphous-to-crystalline transformation of Al2O3 films on a silicon substrate has been carried out. It is found that a critical electron-beam dose rate is required for the transformation to be observed. The possible effect of the silicon substrate on the growth of the Al 2O3 crystallites is also discussed.

UR - https://www.scopus.com/pages/publications/1042267873

U2 - 10.1063/1.353757

DO - 10.1063/1.353757

M3 - Article

AN - SCOPUS:1042267873

SN - 0021-8979

VL - 73

SP - 5272

EP - 5273

JO - Journal of Applied Physics

JF - Journal of Applied Physics

IS - 10

ER -

An in situ transmission electron microscopy study of electron-beam-induced amorphous-to-crystalline transformation of Al₂O₃ films on silicon

Abstract

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