Abnormal grain growth in copper films during magnetically enhanced plasma processing

M. D. Naeem; H. J. Leary; K. Rajan

doi:10.1007/BF02667598

Abnormal grain growth in copper films during magnetically enhanced plasma processing

M. D. Naeem
, H. J. Leary
, K. Rajan

Department of Materials Design and Innovation

IBM
Rensselaer Polytechnic Institute

Research output: Contribution to journal › Article › peer-review

5 Scopus citations

Abstract

The kinetics of grain growth in thin copper films during magnetically enhanced (ME) plasma processing is monitored. Transmission electron microscopy (TEM) results suggest microstructural evolution characteristic of abnormal grain growth in these films. The kinetics of abnormal grain growth appears to depend on gas pressure in the reactor.

Original language	English
Pages (from-to)	1087-1091
Number of pages	5
Journal	Journal of Electronic Materials
Volume	21
Issue number	12
DOIs	https://doi.org/10.1007/BF02667598
State	Published - Dec 1992

Keywords

abnormal grain growth
Cu films
magnetically enhanced plasma process

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10.1007/BF02667598

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@article{5662d9624ecf4301be9ceca849b13fd0,

title = "Abnormal grain growth in copper films during magnetically enhanced plasma processing",

abstract = "The kinetics of grain growth in thin copper films during magnetically enhanced (ME) plasma processing is monitored. Transmission electron microscopy (TEM) results suggest microstructural evolution characteristic of abnormal grain growth in these films. The kinetics of abnormal grain growth appears to depend on gas pressure in the reactor.",

keywords = "abnormal grain growth, Cu films, magnetically enhanced plasma process",

author = "Naeem, \{M. D.\} and Leary, \{H. J.\} and K. Rajan",

year = "1992",

month = dec,

doi = "10.1007/BF02667598",

language = "English",

volume = "21",

pages = "1087--1091",

journal = "Journal of Electronic Materials",

issn = "0361-5235",

publisher = "Springer New York",

number = "12",

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T1 - Abnormal grain growth in copper films during magnetically enhanced plasma processing

AU - Naeem, M. D.

AU - Leary, H. J.

AU - Rajan, K.

PY - 1992/12

Y1 - 1992/12

N2 - The kinetics of grain growth in thin copper films during magnetically enhanced (ME) plasma processing is monitored. Transmission electron microscopy (TEM) results suggest microstructural evolution characteristic of abnormal grain growth in these films. The kinetics of abnormal grain growth appears to depend on gas pressure in the reactor.

AB - The kinetics of grain growth in thin copper films during magnetically enhanced (ME) plasma processing is monitored. Transmission electron microscopy (TEM) results suggest microstructural evolution characteristic of abnormal grain growth in these films. The kinetics of abnormal grain growth appears to depend on gas pressure in the reactor.

KW - abnormal grain growth

KW - Cu films

KW - magnetically enhanced plasma process

UR - https://www.scopus.com/pages/publications/0026980974

U2 - 10.1007/BF02667598

DO - 10.1007/BF02667598

M3 - Article

AN - SCOPUS:0026980974

SN - 0361-5235

VL - 21

SP - 1087

EP - 1091

JO - Journal of Electronic Materials

JF - Journal of Electronic Materials

IS - 12

ER -

Abnormal grain growth in copper films during magnetically enhanced plasma processing

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