Abstract
A highly sensitive photodiode was fabricated with a metal-porous silicon-silicon-metal structure. The porous silicon film was found to be an excellent light trap and antireflection coating for the photodiode. It was demonstrated that close to unity quantum efficiency could be obtained in the wavelength range of630 to 900 nm. The detector response time is about 2 ns for a 9 volts reverse bias. It was also demonstrated that a relative sensitivity ofhigher than 90% could be obtained with incident angles of4O°, 80° and 58° for s-, p-A nd randomly-polarized light. The uniformity and stability of the photodiode were also studied. Porous silicon films can also be used as solar cells to improve the acceptance angle of the sunlight. Possible mechanisms to this photodiode and roles ofthe porous silicon film are discussed.
| Original language | English |
|---|---|
| Pages (from-to) | 262-270 |
| Number of pages | 9 |
| Journal | Proceedings of SPIE - The International Society for Optical Engineering |
| Volume | 2149 |
| DOIs | |
| State | Published - May 2 1994 |
| Event | Technologies for Optical Fiber Communications 1994 - Los Angeles, United States Duration: Jan 23 1994 → Jan 29 1994 |
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