Abstract
The deposition and stripping of very small amounts of copper from 0.2M H2SO4 has been investigated. Procedures were devised for depositing a known, small amount of copper on the disk of a rotating platinum ring-disk electrode, either by constant current or constant potential electrolysis. During deposition and stripping of copper it was found that a significant amount of Cu(I) can form in 0.2M H2SO4 media. Quantitative agreement was found between the amount of Cu(I) and Cu(II) produced during electrochemical oxidation of a copper-plated platinum disk and the disk oxidation current. Conditions are given for the quantitative deposition and stripping of copper without interference from Cu(I) formation.
| Original language | English |
|---|---|
| Pages (from-to) | 1637-1640 |
| Number of pages | 4 |
| Journal | Analytical Chemistry |
| Volume | 40 |
| Issue number | 11 |
| DOIs | |
| State | Published - Aug 1 1968 |
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