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4.4 kV β-Ga2O3MESFETs with power figure of merit exceeding 100 MW cm-2

  • Arkka Bhattacharyya
  • , Shivam Sharma
  • , Fikadu Alema
  • , Praneeth Ranga
  • , Saurav Roy
  • , Carl Peterson
  • , Geroge Seryogin
  • , Andrei Osinsky
  • , Uttam Singisetti
  • , Sriram Krishnamoorthy
  • University of Utah
  • SUNY Buffalo
  • Agnitron Technology Incorporated
  • University of California at Santa Barbara

Research output: Contribution to journalArticlepeer-review

70 Scopus citations

Abstract

β-Ga2O3 metal-semiconductor field-effect transistors are realized with superior reverse breakdown voltages (V BR) and ON currents (I DMAX). A sandwiched SiN x dielectric field plate design is utilized that prevents etching-related damage in the active region and a deep mesa-etching was used to reduce reverse leakage. The device with L GD = 34.5 μm exhibits an I DMAX of 56 mA mm-1, a high I ON/I OFF ratio >108 and a very low reverse leakage until catastrophic breakdown at ∼44.4 kV. A power figure of merit (PFOM) of 132 MW cm-2 was calculated for a V BR of ∼44.4 kV. The reported results are the first >4 kV class Ga2O3 transistors to surpass the theoretical unipolar FOM of silicon.

Original languageEnglish
Article number061001
JournalApplied Physics Express
Volume15
Issue number6
DOIs
StatePublished - Jun 2022

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