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226 nm AlGaN/AlN UV LEDs using p-type Si for hole injection and UV reflection

  • Dong Liu
  • , Sang June Cho
  • , Jeongpil Park
  • , Jiarui Gong
  • , Jung Hun Seo
  • , Rafael Dalmau
  • , Deyin Zhao
  • , Kwangeun Kim
  • , Munho Kim
  • , Akhil R.K. Kalapala
  • , John D. Albrecht
  • , Weidong Zhou
  • , Baxter Moody
  • , Zhenqiang Ma
  • University of Wisconsin-Madison
  • HexaTech, Inc.
  • University of Texas at Arlington
  • Michigan State University

Research output: Contribution to journalArticlepeer-review

86 Scopus citations

Abstract

Deep ultraviolet (UV) light-emitting diodes (LEDs) at a wavelength of 226 nm based on AlGaN/AlN multiple quantum wells using p-type Si as both the hole supplier and the reflective layer are demonstrated. In addition to the description of the hole transport mechanism that allows hole injection from p-type Si into the wide bandgap device, the details of the LED structure which take advantage of the p-type Si layer as a reflective layer to enhance light extraction efficiency (LEE) are elaborated. Fabricated LEDs were characterized both electrically and optically. Owing to the efficient hole injection and enhanced LEE using the p-type Si nanomembranes (NMs), an optical output power of 225 μW was observed at 20 mA continuous current operation (equivalent current density of 15 A/cm2) without external thermal management. The corresponding external quantum efficiency is 0.2%, higher than any UV LEDs with emission wavelength below 230 nm in the continuous current drive mode. The study demonstrates that adopting p-type Si NMs as both the hole injector and the reflective mirror can enable high-performance UV LEDs with emission wavelengths, output power levels, and efficiencies that were previously inaccessible using conventional p-i-n structures.

Original languageEnglish
Article number011111
JournalApplied Physics Letters
Volume113
Issue number1
DOIs
StatePublished - Jul 2 2018

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